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Growth, characterization and micro-pattern fabrication of iridium/Si3N4/Si(100) thin films

✍ Scribed by Min Wu; Jian Zhou; Zhigang Sun; Haihu Yu; Erdan Gu

Book ID
107403478
Publisher
Wuhan University of Technology
Year
2008
Tongue
English
Weight
374 KB
Volume
23
Category
Article
ISSN
1000-2413

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In view of the integration within Si-based optical devices, LPCVD (low-pressure chemical vapor deposition) thin-film Si 3 N 4 waveguides have been fabricated on a Si substrate within a CMOS fabrication pilot-line. Different structures (channel, rib and strip-loaded) were designed, fabricated and cha