𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Synthesis and characterization of Si3N4 thin nanobelts via direct nitridation of Si powders

✍ Scribed by Feng Wang; Xiao Fang Qin; Guo Qiang Jin; Ying Yong Wang; Xiang Yun Guo


Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
915 KB
Volume
41
Category
Article
ISSN
1386-9477

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Temperature-controlled synthesis of Si3N
✍ Feng Wang; Xiaofang Qin; Guoqiang Jin; Xiangyun Guo πŸ“‚ Article πŸ“… 2010 πŸ› Elsevier Science 🌐 English βš– 434 KB

Si 3 N 4 nanomaterials with different morphologies have been synthesized via direct nitridation of Si powders without using any catalyst by controlling the reaction temperature. The purified Si 3 N 4 samples were characterized by X-ray diffraction and transmission electron microscopy. The results sh

Laser Synthesis and Characterization of
✍ Doh?evi?-Mitrovi?, Z.D. ;Popovi?, Z.V. πŸ“‚ Article πŸ“… 2000 πŸ› John Wiley and Sons 🌐 English βš– 176 KB πŸ‘ 2 views

We presented both laser synthesis and characterization of ultrafine nanometric (12 to 20 nm diameter) Si/C/N powders starting from NH 3 , SiH 4 and C 2 H 2 gas mixture, using a continuous-wave CO 2 laser. The main parameters affecting this process are: the reactant flow ratio R F NH3 =F SiH4 , the C

Carbothermal synthesis of silicon nitrid
✍ A. Ortega; M.D. AlcalΓ‘; C. Real πŸ“‚ Article πŸ“… 2008 πŸ› Elsevier Science 🌐 English βš– 501 KB

Sample controlled reaction temperature (SCRT) has been used for the first time to study the kinetics of the carbothermal reduction of silica in nitrogen to obtain silicon nitride (Si 3 N 4 ). It is noteworthy to point out that SCRT method allows both a good control of pressure in the sample surroun

Fabrication and optical characterization
✍ N. Daldosso; M. Melchiorri; F. Riboli; F. Sbrana; L. Pavesi; G. Pucker; C. Kompo πŸ“‚ Article πŸ“… 2004 πŸ› Elsevier Science 🌐 English βš– 255 KB

In view of the integration within Si-based optical devices, LPCVD (low-pressure chemical vapor deposition) thin-film Si 3 N 4 waveguides have been fabricated on a Si substrate within a CMOS fabrication pilot-line. Different structures (channel, rib and strip-loaded) were designed, fabricated and cha