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Growth and microhardness of SiC films by plasma-enhanced chemical vapor deposition

✍ Scribed by Ji-Youn Seo; Seog-Young Yoon; Koichi Niihara; Kwang Ho Kim

Book ID: 108388380
Publisher: Elsevier Science
Year: 2002
Tongue: English
Weight: 331 KB
Volume: 406
Category: Article
ISSN: 0040-6090
DOI: 10.1016/s0040-6090(02)00061-5

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