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Growth and characterization of YBa2Cu3O7−δ thin films with specifically reduced critical temperature

✍ Scribed by H. Behner; K. Rührnschopf; G. Wedler; W. Rauch

Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
404 KB
Volume
216
Category
Article
ISSN
0921-4534

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✦ Synopsis

For the purpose of fabricating alI-YBCO S-N-S Josephson junctions, thin films of YBa2Cu3OT_~ (YBCO) with reduced critical temperature (YBCO*) were prepared by means of DC-magnetron sputtering. The YBCO* films showed a critical temperature around 70 K which could not be increased by an oxygen or oxygen plasma treatment. The samples were characterized by resistivity measurements, X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and low-energy electron diffraction (LEED).

The growth conditions and the properties of these samples are discussed with respect to the sputter parameters and properties of high-quality (T¢= 90 K,j¢> 106 A/cm 2) YBCO thin fdms.

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