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Grain growth in copper interconnect lines

✍ Scribed by W. Wu; D. Ernur; S.H. Brongersma; M. Van Hove; K. Maex


Book ID
104050230
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
392 KB
Volume
76
Category
Article
ISSN
0167-9317

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Stresses in thin films and interconnect
✍ P. Gudmundson; A. WikstrΓΆm πŸ“‚ Article πŸ“… 2002 πŸ› Elsevier Science 🌐 English βš– 592 KB

The mechanical behavior of thin films and interconnect lines is investigated. Firstly, theoretical models of thermal stress evolution in thin films and passivated or unpassivated lines are considered. Secondly, the effect of texture in a copper thin film with a columnar grain structure is studied fr