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A grain structure based statistical simulation of electromigration damage in chip level interconnect lines

✍ Scribed by T.M. Korhonen; D.D. Brown; M.A. Korhonen


Book ID
108361790
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
233 KB
Volume
40
Category
Article
ISSN
0026-2714

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