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Glancing-angle X-ray diffraction and X-ray photoelectron spectroscopy studies of nitrogen-implanted tantalum

✍ Scribed by P.M Raole; A.M Narsale; D.C Kothari; P.S Pawar; S.V Gogawale; L Guzman; M Dapor

Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
370 KB
Volume
115
Category
Article
ISSN
0921-5093

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## X-ray photoelectron spectra of two Ta-Ti bilayers on a Si wafer are measured using a soft x-ray synchrotron radiation beamline at the Photon Factory. The grazing incident x-rays are used to excite photoelectrons. The photoelectron intensity dependence is measured as the change in the glancing an