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Structure analysis of the system Hafnium/Silicon by means of X-ray photoelectron spectroscopy and X-ray photoelectron diffraction (XPD)

✍ Scribed by C.R. Flüchter; A. de Siervo; D. Weier; M. Schürmann; U. Berges; S. Dreiner; M.F. Carazzolle; R. Landers; G.G. Kleiman; C. Westphal

No coin nor oath required. For personal study only.

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