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Total reflection x-ray photoelectron spectroscopy of a tantalum–titanium multilayer

✍ Scribed by Jun Kawai; Makoto Sai; Tetsuro Sugimura; Kouichi Hayashi; Hisataka Takenaka; Yoshinori Kitajima

Publisher
John Wiley and Sons
Year
1999
Tongue
English
Weight
89 KB
Volume
28
Category
Article
ISSN
0049-8246

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✦ Synopsis

X-ray photoelectron spectra of two

Ta-Ti bilayers on a Si wafer are measured using a soft x-ray synchrotron radiation beamline at the Photon Factory. The grazing incident x-rays are used to excite photoelectrons. The photoelectron intensity dependence is measured as the change in the glancing angle of the incident x-rays. A change in the angular dependence of photoelectron intensity and a chemical shift are observed with change in thermal treatment of the multilayer sample.

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