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GaN reactive ion etching using SiCl4:Ar:SF6chemistry

✍ Scribed by E. Sillero; F. Calle; M. A. Sánchez-García

Book ID: 106397328
Publisher: Springer US
Year: 2005
Tongue: English
Weight: 840 KB
Volume: 16
Category: Article
ISSN: 0957-4522
DOI: 10.1007/s10854-005-2306-4

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