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Free radical fast photo-cured gate dielectric for top-gate polymer field effect transistors

โœ Scribed by Zied Fahem; Wolfgang Bauhofer


Book ID
113834528
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
275 KB
Volume
13
Category
Article
ISSN
1566-1199

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๐Ÿ“œ SIMILAR VOLUMES


Ultra-thin polymer gate dielectrics for
โœ Yong-Young Noh; Henning Sirringhaus ๐Ÿ“‚ Article ๐Ÿ“… 2009 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 877 KB

We have demonstrated top-gate polymer field-effect transistors (FETs) with ultra-thin (30-50 nm), room-temperature crosslinkable polymer gate dielectrics based on blending an insulating base polymer such as poly(methyl methacrylate) with an organosilane crosslinking agent, 1,6-bis(trichlorosilyl)hex