The growth and characterization of zirconium oxide (ZrO 2 ) thin films prepared by thermal oxidation of a deposited Zr metal layer on SiO 2 /Si were investigated. Uniform ZrO 2 thin film with smooth surface morphology was obtained. The thermal ZrO 2 films showed a polycrystalline structure. The diel
โฆ LIBER โฆ
Formation of zirconium silicide between silicon substrate and zirconium films
โ Scribed by Liu, Wei; Liang, Jianhua; Zhou, Xiaosong; Long, Xinggui
- Book ID
- 122243568
- Publisher
- Elsevier Science
- Year
- 2014
- Tongue
- English
- Weight
- 914 KB
- Volume
- 122
- Category
- Article
- ISSN
- 0167-577X
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