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Deposition of copper films on silicon substrates: Film purity and silicide formation

✍ Scribed by Padiyath, R.; Seth, Jayshree; Babu, S. V.; Matienzo, L. J.

Book ID
127096648
Publisher
American Institute of Physics
Year
1993
Tongue
English
Weight
1007 KB
Volume
73
Category
Article
ISSN
0021-8979

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## Abstract A one‐step electroless deposition method was developed to synthesize sponge‐like copper film with favourable mechanical adhesion on silicon substrate. X‐ray diffraction and X‐ray photoelectron spectroscopy analysis and field emission scanning electron microscopy observations indicate th