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Formation of ultrathin silicon oxides—modeling and technological constraints

✍ Scribed by Romuald B. Beck

Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 241 KB
Volume: 6
Category: Article
ISSN: 1369-8001
DOI: 10.1016/s1369-8001(03)00071-4

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