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The formation of ultrathin silicon oxide films using H2/N2O mixtures

โœ Scribed by Robert J. Kee; Wenhua Yang; Neal Sullivan; Anthony M. Dean; Ali Zojaji; Michael Hall; Meredith Williams


Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
907 KB
Volume
29
Category
Article
ISSN
1540-7489

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