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Formation of thin film dielectrics by remote plasma-enhanced chemical-vapor deposition (remote PECVD)

✍ Scribed by G. Lucovsky; D.V. Tsu; S.S. Kim; R.J. Markunas; G.G. Fountain

Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 917 KB
Volume: 39
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(89)90418-2

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