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Formation of supported nanoparticles from island thin films during ion etching

✍ Scribed by Z Pászti; G Pető; Z.E Horváth; O Geszti; A Karacs; L Guczi


Book ID
114164418
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
200 KB
Volume
178
Category
Article
ISSN
0168-583X

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Polystyrene films of 100 nm thickness were modified using plasma immersion ion implantation (PIII) with argon ions of energy 20 keV and fluences in the range 2 • 10 14 -2 • 10 16 ions cm À2 . The structure and properties of the films were determined by ellipsometry and FTIR spectroscopy, as well as