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Formation of pyramid-like nanostructures during cobalt film growth by magnetron sputtering

✍ Scribed by C.-P. Liu; J.-J. Chang; S.-W. Chen; H.-C. Chung; Y.-L. Wang

Book ID
106019799
Publisher
Springer
Year
2005
Tongue
English
Weight
465 KB
Volume
80
Category
Article
ISSN
1432-0630

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In this work a single Langmuir probe has been used to determine in-situ the plasma electronic temperature (T e ) and the electronic density (h e ) of an rf magnetron sputtering system used to grow CN x films. Sodium chloride substrates and a carbon target (99.999%) in a mixture of Ar/N 2 were used.