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Substrate bias effects during in situ growth of Y1Ba2Cu3O7−δthin films by RF magnetron sputtering

✍ Scribed by R. Pinto; J.I. Poothra; S.P. Pai; L.C. Gupta; R. Vijayaraghavan; Dhananjay Kumar; M. Sharon


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
436 KB
Volume
175
Category
Article
ISSN
0921-4534

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In situ thin films of YBa2Cu3O7 prepared
✍ J.-M. Triscone; M.G. Karkut; O. Brunner; L. Antognazza; M. Decroux; Ø. Fischer 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 347 KB

We have prepared in situ thin films of YBa2fu307 by single target dc reactive magnetron sputtering. By a delicate adjustment of the oxygen partial pressure as well as the total sputtering pressure, we can grow stoichiometric films using a stoichiometric target. This method gives highly reproducible