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Formation of nanosize structures on a silicon substrate by method of focused ion beams

โœ Scribed by O. A. Ageev; A. S. Kolomiytsev; B. G. Konoplev

Book ID
111445106
Publisher
Springer
Year
2011
Tongue
English
Weight
298 KB
Volume
45
Category
Article
ISSN
1063-7826

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Fabrication of MSM detector structures o
Fabrication of MSM detector structures on silicon by focused ion beam implantation
โœ J. Teichert; L. Bischoff; S. Hausmann ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 239 KB

We report the fabncation of metal-semiconductor-metal (MSM) photo detectors on silicon substrates with CoSi2 electrodes. The electrode patterns have been formed by ion beam synthesis applying maskless implantation with a cobalt focused ion beam. Implantation has been carried out with the substrate a