Formation of nanoporous poly(methyl silsesquioxane) thin films using adamantane for low-k application

✍ Scribed by B. J. Cha; J. M. Yang

• Book ID: 101590940
• Publisher: John Wiley and Sons
• Year: 2007
• Tongue: English
• Weight: 331 KB
• Volume: 104
• Category: Article
• ISSN: 0021-8995
• DOI: 10.1002/app.25886

✦ Synopsis

Abstract

Nanoporous poly(methyl silsesquioxane) PMSSQ thin films for low‐k application have been prepared using chemically attached adamantylphenols as pore generating materials (porogen). To obtain the mechanically stable porous structure, multifunctional 1,2‐bistrimethoxysilylethane (BTMSE) was employed in addition to methyltrimethoxysilane as a main matrix material. From the decomposition of porogen, confirmed by FTIR and TGA, the nanoporous thin films containing pores less than 5 nm, which are characterized using sorption analysis, were successfully achieved. The dielectric constant was significantly decreased to 1.9, while maintaining the stable mechanical properties with the elastic modulus of 3.7 GPa measured by a nanoindenter. © 2007 Wiley Periodicals, Inc. J Appl Polym Sci 2007