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Nanoporous Ultra-Low-Dielectric-Constant Fluoropolymer Films via Selective UV Decomposition of Poly(pentafluorostyrene)-block-Poly(methyl methacrylate) Copolymers Prepared Using Atom Transfer Radical Polymerization

✍ Scribed by G.-D. Fu; Z. Yuan; E.-T. Kang; K.-G. Neoh; D. M. Lai; A. C. H. Huan


Publisher
John Wiley and Sons
Year
2005
Tongue
English
Weight
468 KB
Volume
15
Category
Article
ISSN
1616-301X

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