## Abstract Nanoporous poly(methyl silsesquioxane) PMSSQ thin films for low‐k application have been prepared using chemically attached adamantylphenols as pore generating materials (porogen). To obtain the mechanically stable porous structure, multifunctional 1,2‐bistrimethoxysilylethane (BTMSE) wa
Synthesis of Poly(methyl-co-trifluoropropyl)silsesquioxanes and Their Thin Films for Low Dielectric Application
✍ Scribed by Jingyu Hyeon-Lee; Woon Chun Kim; Sung Kyu Min; Hee-Woo Ree; Do Y. Yoon
- Book ID
- 102490078
- Publisher
- John Wiley and Sons
- Year
- 2003
- Tongue
- English
- Weight
- 118 KB
- Volume
- 288
- Category
- Article
- ISSN
- 1438-7492
No coin nor oath required. For personal study only.
✦ Synopsis
Abstract
Poly(methyl‐co‐trifluoropropyl)silsesquioxanes (P(M‐co‐TFP)SSQs) were prepared using methyltrimethoxysilane (MTMS) and trifluoropropyltrimethoxysilane (TFPTMS). The molecular weight, microstructure of the copolymers and properties of their thin films have been changed by adjusting reaction parameters such as the molar ratio of water to silane, the molar ratio of catalyst to silane, reaction time, solvent content, and temperature. The refractive index of the copolymer thin film decreased from 1.404 to ca. 1.348 as curing temperature was increased to 420 °C. The dielectric constant of the film decreased with an increase of the molecular weight of the copolymer, and the lowest dielectric constant obtained was ca. 2.2. Hardness and elastic modulus of the thin films were 0.7 and 5 GPa, respectively. Crack velocity was measured to be 10^−11^ m/s at the film thickness of around 0.9 μm under aqueous environment.
magnified image
📜 SIMILAR VOLUMES
## Abstract The precursors of poly(hydrogen silsesquioxane) (PHSSQ) were synthesized from triethoxysilane (TES) through variations in the pH and molar ratio of water to TES (__R__~1~). The molecular structures of the prepared PHSSQ precursors were controlled by the reaction conditions, including th