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Formation of interface silicides at room temperature in pulsed laser deposited Ti thin films on Si〈1 0 0〉

✍ Scribed by V. Venkataraman; S. Rajagopalan; P. Manoravi; A.K. Balamurugan; A. Ramalingam; A.K. Tyagi

Book ID: 113785110
Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 162 KB
Volume: 38
Category: Article
ISSN: 0025-5408
DOI: 10.1016/j.materresbull.2003.08.002

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