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Formation of bubbles and extended defects in He implanted (1 0 0) Si at elevated temperatures

✍ Scribed by Douglas L. da Silva; Marcio J. Mörschbächer; Paulo F.P. Fichtner; Erwan Oliviero; Moni Behar


Book ID
113822973
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
316 KB
Volume
219-220
Category
Article
ISSN
0168-583X

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