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Formation and crystallization of silicon nanoclusters in SiNx:H films using femtosecond pulsed laser annealings

✍ Scribed by T. T. Korchagina; V. A. Volodin; B. N. Chichkov


Book ID
111444804
Publisher
Springer
Year
2010
Tongue
English
Weight
215 KB
Volume
44
Category
Article
ISSN
1063-7826

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Using sintered TiN and TiN-Ir (Ir contents: 5.9-14.2 at.%) targets, pulsed-laser deposition (PLD) was carried out to produce thin films composed of nanoparticles and particulates in the presence of nitrogen gas. The size (2-100 nm) of the produced crystalline TiN nanoparticles increased as nitrogen