Fluorinated materials for UV nanoimprint lithography
β Scribed by Yasuhide Kawaguchi; Fumiko Nonaka; Yasuhiro Sanada
- Book ID
- 108207729
- Publisher
- Elsevier Science
- Year
- 2007
- Tongue
- English
- Weight
- 325 KB
- Volume
- 84
- Category
- Article
- ISSN
- 0167-9317
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π SIMILAR VOLUMES
A novel liquid photo-polymerization resist was prepared for nanoimprint lithography on transparent flexible plastic substrates. The resist is a mixture of polymethylmethacrylate (PMMA), methylmethacrylate (MMA), methacylic acid (MAA) and two photo-initiators, (2-isopropyl thioxanthone (ITX) and ethy
In nanoimprint lithography, the most common approach to prevent resist to adhere to the mold is to graft a fluorinated anti-sticking layer on the mold's surface. But it is known that these layers suffer from degradation after a certain number of imprints. In this work, we study the influence of the