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Flexible Replication Technique for High-Aspect-Ratio Nanostructures

✍ Scribed by Adriana Szeghalmi; Kornelia Sklarek; Michael Helgert; Robert Brunner; Wilfried Erfurth; Ulrich Gosele; Mato Knez

Publisher
John Wiley and Sons
Year
2010
Tongue
English
Weight
741 KB
Volume
6
Category
Article
ISSN
1613-6810

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✦ Synopsis

Abstract

A flexible, nondestructive, and cost‐effective replication technique for nanostructures is presented. The advantages of the process are: 1) it allows for tailoring structural parameters of the replica (e.g., line width) nearly independent of the structural geometry of the master; 2) it allows for replication of high‐aspect‐ratio structures also in polymer materials from solution (especially noncurable polymers) such as polystyrene and polymethylmethacrylate; 3) it includes an easy separation process, thus preserving the master for repeated use. Linear grating replicas with line widths ranging from 88 to 300 nm are obtained using a single nanostructured master. Nanofibers and complex nanopatterned replicas are achievable. The presented technique and its flexibility show that atomic layer deposition is a unique tool for the preparation of high‐efficiency polarizer diffractive optics, photonics, electronics, and catalysts.

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