Fabrication of Silicon Oxide Thin Films by Mist Chemical Vapor Deposition Method from Polysilazane and Ozone as Sources

✍ Scribed by Piao, Jinchun; Katori, Shigetaka; Kawaharamura, Toshiyuki; Li, Chaoyang; Fujita, Shizuo

• Book ID: 126282606
• Publisher: Institute of Pure and Applied Physics
• Year: 2012
• Tongue: English
• Weight: 617 KB
• Volume: 51
• Category: Article
• ISSN: 0021-4922
• DOI: 10.1143/JJAP.51.090201