Fabrication of poly-Si TFT with silicided Schottky barrier source/drain, high-κ gate dielectric and metal gate

✍ Scribed by Shiyang Zhu; J. Singh; Chunxiang Zhu; A. Du; M.F. Li

• Book ID: 108269518
• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 301 KB
• Volume: 50
• Category: Article
• ISSN: 0038-1101
• DOI: 10.1016/j.sse.2005.11.001