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Fabrication of high-aspect-ratio arrayed structures using Si electrochemical etching

✍ Scribed by Hirotaka Sato; Takayuki Homma

Book ID: 111713756
Publisher: Institute of Physics and National Institute of Materials Science
Year: 2006
Tongue: English
Weight: 516 KB
Volume: 7
Category: Article
ISSN: 1468-6996
DOI: 10.1016/j.stam.2006.04.004

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