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Fabrication of high-aspect-ratio microstructures using SU8 photoresist

✍ Scribed by G. Liu; Y. Tian; Y. Kan

Publisher: Springer-Verlag
Year: 2005
Tongue: English
Weight: 273 KB
Volume: 11
Category: Article
ISSN: 0946-7076
DOI: 10.1007/s00542-004-0452-x

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