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An Epoxy Photoresist Modified by Luminescent Nanocrystals for the Fabrication of 3D High-Aspect-Ratio Microstructures

✍ Scribed by C. Ingrosso; V. Fakhfouri; M. Striccoli; A. Agostiano; A. Voigt; G. Gruetzner; M. L. Curri; J. Brugger


Publisher
John Wiley and Sons
Year
2007
Tongue
English
Weight
430 KB
Volume
17
Category
Article
ISSN
1616-301X

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✍ Shizhuo Yin 📂 Article 📅 1999 🏛 John Wiley and Sons 🌐 English ⚖ 150 KB 👁 1 views

The fabrication of high-aspect-ratio submicron-to-nanometer range microstructures in LiNbO using a state-of-the-art Schlum-3 ( ) berger AMS 3000 focused ion-beam FIB system is presented. The submicron structures with about 350 nm width and 1600 nm depth are fabricated by employing XeF gas-assisted g