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Fabrication of 3 nm wires using 100 keV electron beam lithography and poly(methyl methacrylate) resist

✍ Scribed by Cumming, D. R. S.; Thoms, S.; Beaumont, S. P.; Weaver, J. M. R.

Book ID: 120193605
Publisher: American Institute of Physics
Year: 1996
Tongue: English
Weight: 559 KB
Volume: 68
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.116073

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