Extreme Ultraviolet Lithography (EUV) is viewed by many as the logical extension of current optical lithography which will enable future generations of integrated circuits (ICs) to be printed with feature sizes of 100nm and below. With the completion of the research phase and demonstration of practi
Extreme ultraviolet lithography: overview and development status
β Scribed by Silverman, Peter J.
- Book ID
- 115549024
- Publisher
- The International Society for Optical Engineering
- Year
- 2005
- Tongue
- English
- Weight
- 505 KB
- Volume
- 4
- Category
- Article
- ISSN
- 1932-5150
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
We present our recent results achieved using atomic force microscopy nano-oxidation and nanoindentation of thin layers of polymers, and using extreme ultraviolet interference lithography. We focus our attention on the advantages and drawbacks of such lithographic techniques. In particular, we show t
## Abstract A series of highβperformance polycarbonates have been prepared with glassβtransition temperatures and decomposition temperatures that are tunable by varying the repeatβunit chemical structure. Patterning of the polymers with extreme UV lithography has been achieved by taking advantage o