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Patterning at the nanoscale: Atomic force microscopy and extreme ultraviolet interference lithography

✍ Scribed by P. Parisse; D. Luciani; A. D’Angelo; S. Santucci; P. Zuppella; P. Tucceri; A. Reale; L. Ottaviano

Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
677 KB
Volume
165
Category
Article
ISSN
0921-5107

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✦ Synopsis

We present our recent results achieved using atomic force microscopy nano-oxidation and nanoindentation of thin layers of polymers, and using extreme ultraviolet interference lithography. We focus our attention on the advantages and drawbacks of such lithographic techniques. In particular, we show the possibility to create patterns on polymers compatible with the conventional metal deposition and lift-off processes on submicrometer scale (EUV-IL and nano-indentation) and we experimentally confirm the theoretical prediction on the strong dependence of the oxidation process to the sample conductivity.

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We thank the Leverhulme Trust (UK) for funding this project, and Mr. Jon Lee for his help in preparation of the template-stripped gold. K.S. thanks Calvin College and the Burroughs-Wellcome Fund for sabbatical support.