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Extreme high-aspect ratio AFM


Book ID
104419362
Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
337 KB
Volume
13
Category
Article
ISSN
1369-7021

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High-aspect-ratio silicon dioxide pillar
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## Abstract This paper presents a technique for fabricating highโ€aspectโ€ratio silicon dioxide pillars by electrochemical etching of nโ€type silicon in hydrofluoric acid (HF) solutions. Basic process flow and etching conditions are described, which make it possible to obtain highโ€aspectโ€ratio pillar