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High-Pressure Chemical Deposition for Void-Free Filling of Extreme Aspect Ratio Templates

✍ Scribed by Neil F. Baril; Banafsheh Keshavarzi; Justin R. Sparks; Mahesh Krishnamurthi; Ivan Temnykh; Pier J. A. Sazio; Anna C. Peacock; Ali Borhan; Venkatraman Gopalan; John V. Badding

Book ID: 101418839
Publisher: John Wiley and Sons
Year: 2010
Tongue: English
Weight: 474 KB
Volume: 22
Category: Article
ISSN: 0935-9648
DOI: 10.1002/adma.201001199

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