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Extraction of effective dielectric constants and the effect of process damage of low-k dielectrics for advanced interconnects

✍ Scribed by Y.L. Cheng; Y.L. Wang; H.C. Chen


Book ID
108289472
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
328 KB
Volume
515
Category
Article
ISSN
0040-6090

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