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Extension of the model for Ar+ ion induced etching of Si by SF6

✍ Scribed by G.N.A. van Veen; F.H.M. Sanders; J. Dieleman; P.C. Zalm; D.J. Oostra; A.E. de Vries

Book ID: 114168183
Publisher: Elsevier Science
Year: 1987
Tongue: English
Weight: 354 KB
Volume: 19-20
Category: Article
ISSN: 0168-583X
DOI: 10.1016/s0168-583x(87)80203-3

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