✦ LIBER ✦
Use of plasma impedance monitoring for the determination of SF6reactive ion etch process end points in a SiO2/Si system
✍ Scribed by M. N. A. Dewan; P. J. McNally; T. Perova; P. A. F. Herbert
- Publisher
- Maney Publishing
- Year
- 2001
- Tongue
- English
- Weight
- 222 KB
- Volume
- 5
- Category
- Article
- ISSN
- 1432-8917
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