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Ex situ annealing effect on Nb thin films prepared by DC magnetron sputtering

โœ Scribed by Y.W. Kim; S.-G. Lee; J.-H. Choi

Book ID
113850602
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
668 KB
Volume
471
Category
Article
ISSN
0921-4534

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In situ thin films of YBa2Cu3O7 prepared
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โœ J.-M. Triscone; M.G. Karkut; O. Brunner; L. Antognazza; M. Decroux; ร˜. Fischer ๐Ÿ“‚ Article ๐Ÿ“… 1989 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 347 KB

We have prepared in situ thin films of YBa2fu307 by single target dc reactive magnetron sputtering. By a delicate adjustment of the oxygen partial pressure as well as the total sputtering pressure, we can grow stoichiometric films using a stoichiometric target. This method gives highly reproducible