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Evaluation of concentration-depth profiles by sputtering in SIMS and AES

✍ Scribed by S. Hofmann

Book ID
104998916
Publisher
Springer
Year
1976
Tongue
English
Weight
636 KB
Volume
9
Category
Article
ISSN
1432-0630

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Depth resolution in sputter depth profil
Depth resolution in sputter depth profiling-characterization of a third batch of tantalum pentoxide on tantalum certified reference material by AES and SIMS
✍ Seah, M. P.; Spencer, S. J.; Gilmore, I. S.; Johnstone, J. E. πŸ“‚ Article πŸ“… 2000 πŸ› John Wiley and Sons 🌐 English βš– 318 KB πŸ‘ 2 views

Depth profiles have been made for a new batch of the certified reference material, BCR 261, of ~30 nm and 100 nm of anodic tantalum pentoxide layers on tantalum foil. Atomic force microscopy studies show that the preparation method traditionally used provides an excellent substrate root-mean-square