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Etching effect of the autocloning structure using ion-assisted deposition

โœ Scribed by Yu-Wen Yeh; Te-Hung Chang; Sheng-Hui Chen; Cheng-Chung Lee


Book ID
106255835
Publisher
Optical Society of Japan
Year
2009
Tongue
English
Weight
317 KB
Volume
16
Category
Article
ISSN
1340-6000

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Effect of the deposition rate on ITO thi
โœ Meng, Li-Jian ;Teixeira, V. ;dos Santos, M. P. ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 507 KB

## Abstract Indium tin oxide (ITO) thin films have been deposited onto glass substrates at room temperature by ion beam assisted deposition technique at different deposition rates (0.1โ€“0.3โ€‰nm/s). The effects of the deposition rate on the structural, optical and electrical properties of the deposite