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Effect of ion irradiation during deposition on the structure of alumina thin films grown by plasma assisted chemical vapour deposition

✍ Scribed by O. Kyrylov; D. Kurapov; J.M. Schneider

Publisher: Springer
Year: 2004
Tongue: English
Weight: 343 KB
Volume: 80
Category: Article
ISSN: 1432-0630
DOI: 10.1007/s00339-004-2998-y

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