Etching characteristics and plasma-induced damage of Ba0.65Sr0.35TiO3 thin films etched in CF4/Ar/O2 plasma

✍ Scribed by Zuci Quan; Baishun Zhang; Tianjin Zhang; Tao Guo; Ruikun Pan; Juan Jiang

• Book ID: 108207690
• Publisher: Elsevier Science
• Year: 2007
• Tongue: English
• Weight: 388 KB
• Volume: 84
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2006.12.007