๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Effects of O2 annealing after etching SrBi2Ta2O9 thin film in Cl2/CF4/Ar plasma

โœ Scribed by Dong-Pyo Kim; Chang-Il Kim; Byoung-Gon Yu

Book ID
108411280
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
511 KB
Volume
66
Category
Article
ISSN
0167-9317

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Role of interfacial diffusion in SrBi2Ta
Role of interfacial diffusion in SrBi2Ta2O9 thin-film capacitors
โœ Ai-Dong Li; Di Wu; Hui-Qin Ling; Tao Yu; Zhi-Guo Liu; Nai-Ben Ming ๐Ÿ“‚ Article ๐Ÿ“… 2003 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 322 KB

SrBi Ta O (SBT) thin films were prepared on Pt / TiO / SiO / Si substrates by metalorganic decomposition 2 2 9 2 2 method. Impact of interfacial diffusion on structural and electrical properties of SBT film capacitors has been investigated by X-ray diffraction (XRD), scanning electron microscopy, Au