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Etching and deposition phenomena in an R.F. CH4 plasma

✍ Scribed by StanisŁaw Mitura; Leszek Klimek; ZdzisŁaw Haś


Book ID
103429011
Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
748 KB
Volume
147
Category
Article
ISSN
0040-6090

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