Epitaxial NiMnSb thin films prepared by facing targets sputtering
✍ Scribed by D Ristoiu; J.P Nozières; L Ranno
- Book ID
- 114223069
- Publisher
- Elsevier Science
- Year
- 2000
- Tongue
- English
- Weight
- 329 KB
- Volume
- 219
- Category
- Article
- ISSN
- 0304-8853
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The facing targets sputtering (FTS) system, typical of plasma-free sputtering systems, was used to deposit aluminum thin films composed of very fine grains with a smooth surface, large hardness and low resistivity. When the argon gas pressure PAr was as low as 10-' Pa, the aluminum films deposited a
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