𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Enhanced electron trapping near channel edges in NMOS transistors

✍ Scribed by Balasinski, A.; Ma, T.-P.


Book ID
114534660
Publisher
IEEE
Year
1992
Tongue
English
Weight
729 KB
Volume
39
Category
Article
ISSN
0018-9383

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Enhancement of two-dimensional electron
✍ Hashimoto, Shin ;Akita, Katsushi ;Yamamoto, Yoshiyuki ;Ueno, Masaki ;Nakamura, T πŸ“‚ Article πŸ“… 2012 πŸ› John Wiley and Sons 🌐 English βš– 328 KB

## Abstract We have demonstrated a high sheet carrier concentration in AlGaN‐channel high‐electron‐mobility transistors (HEMTs) with AlN barrier layer. We investigate the epitaxial structure of these HEMTs by X‐ray diffraction and reveal that the partial lattice relaxation occurs in the Al~0.51~GaN